DISS 5 Lithography
An extension module for our active image scanning system DISS 5. Learn more:
Lithography Product sheet (size: 224 KB)
Description
PE lithography is an extension module of our active Digital Imaging Scanning System DISS 5. This low-cost module allows the structuring of surfaces with an ion beam or the partial exposure of photo-sensitive layer to the nanometer scale.
The synchronous application of structuring and imaging processes, controlled by the same scanning unit allows an extremely high spatial resolution, so that no elaborate calibration work on the imaging system is needed. The user is therefore in a position to control the lithography process and intervene on demand.
The PE lithography module consists of a hardware and software. The hardware, a digital scan generator with an automatic image recording unit, is simply to connect to an existing ion or electron beam systems, and the accompanying software controls the complete lithography process. The software provides addional to the control of the lithography a tool to create masks.
The 3D structures can be designed on the PC with a construction program, based on scalable vector graphics (SVG). This format also defines the interface to other CAD programs, so that their import standard already exists. The designing software is well equipped with a variety of features and enables rapid creation of any 3D structures on the PC.
Operating principle
Image examples
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SEM record Siemens star -
2D AFM record -
3D AFM record
Source of displayed images: FZ Rossendorf, Dr. Bischoff