Workshop: State-of-the-art SEM Nanoprobing and Electrical Failure Analysis for Next-Generation Semiconductors

May 18, 2026

About the Workshop

Device characterization and failure analysis workflows for advanced semiconductor technology.

This joint Imina Technologies and point electronic workshop, held in cooperation with Fraunhofer IMWS, demonstrates our latest in-situ SEM nanoprobing and electrical failure analysis (EFA) hard- and software. Our fully integrated Nanoprobing and EFA solution offers streamlined workflow designed to shorten the learning curve, simplify sample characterization, and save time.

We will present fast and precise sample navigation and characterization, low-noise signal acquisition, and multi-channel failure detection with in-situ pre-amplifiers and live color-coded signal overlay. Our application experts and system users from Fraunhofer IMWS will share insights about their experiences with different applications.

Some specific measurements you can expect in the demo:

  • Quickly navigating the sample and precisely landing the probes to establish stable electrical contact;
  • Measurements of IV, leakage, etc, with guided step-by-step workflows;
  • Advanced EFA with low-noise Resistive Contrast Imaging (RCI) and other electron beam collecting techniques.

Presented by:

Imina Technologies SA

point electronic GmbH

Fraunhofer IMWS

Event Pricing

The workshop is free of charge, and will also include a guided tour around Fraunhofer IMWS.

It can be attended even without participating in the CAM workshop.

To attend, your registration is required.

Register

How to find us.
How to find us.

Event Time and Location

Monday, May 18th, 2026

2 p.m. – 5:30pm

Fraunhofer IMWS building, Heideallee 19, 06120 Halle (Saale)